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​High Purity Mo Ion Implanting Products For Semiconductor Application

Categories Molybdenum Products
Brand Name: JX
Model Number: ​High Purity W,Mo Ion Implanting Products for semiconductor Application
Certification: ISO 9001
Place of Origin: CHINA
MOQ: 10kg
Price: Negotiable
Payment Terms: L/C, T/T, D/P, Western Union
Supply Ability: 500 kg per month
Delivery Time: 15-20 days
Packaging Details: plywood cases
Product Name: ​High Purity W,Mo Ion Implanting Products for semiconductor Application
Grade: Mo
Density: 10.2 g/cm3
Purity: >=99.95%
Tensile Strength: >320 MPa
Elongation: <21%
Standard: ASTM B387-2010
Application: Semiconductor Industry
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​High Purity Mo Ion Implanting Products For Semiconductor Application

​High Purity W,Mo Ion Implanting Products for semiconductor Application


application


During ion implantation, the conversion of the ion source into plasma ions will produce a working temperature of more than 2000 ℃, and when the ion beam erupts, it will also produce a lot of ion kinetic energy, and the general metal will soon be burned. Therefore, inert metals with relatively large mass and density are needed to maintain the direction of ion beam eruption and increase the durability of components. Tungsten materials have the advantages of stable high-temperature chemical properties, small thermal denaturation and long service life, and have become the first choice of ion sources and consumables for ion implanters in the semiconductor industry. The shielding cylinder of the emission cathode, the emission panel, the central fixed rod, the wire electrode plate in the arc starting chamber, etc. are collectively referred to as ion implanted tungsten parts


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Tungsten products

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Tungsten heating element for vacuum furnace and high temperature furnace.

Tungsten part made to customer's drawings.


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