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Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine

Categories PVD and PECVD DLC Coating System
Brand Name: ROYAL
Model Number: RTSP1000
Certification: CE
Place of Origin: China
MOQ: 1 set
Supply Ability: 10 sets per month
Delivery Time: 10~12 weeks
Packaging Details: Export standard, to be packed in new cases/cartons, suitable for long-distance ocean/air and inland transportation.
Technology: Pulsed Closed Field Unbalanced Magnetron Sputtering
Targets: Ta, Ni, Cr, Ti, Au, Ag, SS, Cu, Zr, Al etc.
Warranty: Limited warranty 1 year for free, whole life for machine
Coating: PVD Machine, Vacuum Coating
After-sales service provided: Engineers available to service machinery overseas, maintenance and repair service, installation, commissioning and training, Video technical support
Application: Industrial massive production, Lab R&D
Factory Location: Shanghai city, China
Worldwide Service: Poland - Europe; Iran- West Asia & Middle East, Turkey, India, Mexico- South America
Training Service: Machine operation, maintenance, coating process Recipes, program
OEM & ODM: available, we support tailor made design and fabrication
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Closed Field Unbalanced Magnetron Sputtering System, CE Certified PVD Ion Plating Machine


Closed field unbalanced magnetron sputtering deposition system, Unbalanced Magnetron Sputtering Ion Plating


Unbalanced and closed field magnetron processes have all the advantages of planar magnetrons. Additional advantages and disadvantages are:

  • Additional ion bombardment resulting in dense, adherent films
  • Ion assist and substrate cleaning possible
  • Improved tribological, wear and corrosion resistant films
  • Amenable to multilayer, superlattice, nanolaminant and nanocomposite films
  • Poorer materials usage
  • More complex cathode configuration/expense

Unbalanced and closed field magnetron sputtering revolutionized properties achievable by magnetron sputtering processes. As successful with improved thin film tribological, corrosion resistance and optical properties as this technology was, improvements in magnetron technology had just begun. Next Blog we move onto rotating and cylindrical magnetron processes and resulting thin film applications.

--- Above Artical from P E T E R M A R T I N


Royal technology developed high yield and high target utilization sputtering cathodes, especially for rare and expensive metals sputtering: Au Gold, Ta Tantalum, Ag silver metal films deposition. The high uniformity film's deposition system have been serving several industries like Electronics parts, medical instruments components which require high film uniformity, multiple layers deposition.


The RTSP1000 machine is a standardized machine developed by Royal technology. Extensive applied with cutting/forming tools, molds, medical instruments, electronics components, automotive industries.


RTSP1000 Main Configurations and Technical Parameters
MODELRTSP1000
TECHNOLOGYMF magnetron sputtering + ion source plasma cleaning
CHAMBER MATERIALStainless Steel (S304)
CHAMBER SIZEΦ1000*800mm (H)
CHAMBER TYPED shape
ROTATION RACK & JIG SYSTEM6 satellites Max. weight: 500kgs
POWER SUPPLIES

Qty. of Sputtering: 2*24 KW Bias of Power Supply: 1*20W Ion Source Power supply 1*5KW

DEPOSITION MATERIALTi/Cr/TiAl /Ta/Cu/Au/Carbon etc.
DEPOSITION SOURCE2 pairs (4 pieces) Planar Sputtering Cathodes +
1 Linear Ion Source
Uniformity Area: ±10~15%
CONTROLPLC(Programmable Logic Controller) + Touch Screen ( manual+ auto+ semi-auto operation models)
PUMP SYSTEMRotary Vane Pump: SV300B - 1 set (Leybold)
Roots Pump: WAU1001- 1 set (Leybold)
Holding Pump: D60C- 1 set (Leybold)
Magnetic Suspension Molecular Pump - 1 set (Leybold)
GAS MASS FLOW CONTROLLER4 channels, Made in China, Seven Star (CS series, ) digital model
VACUUM GAUGEModel: ZDF-X-LE, Made in China: ZDF-X-LE
LINEAR ION SOURCE1 piece Pre-treating, plasma cleaning + assisted deposition
SAFETY SYSTEMNumerous safety interlocks to protect operators and equipment
HEATINGHeaters: 30KW. Max. temp.: 450℃
COOLINGIndustrial Chiller (Cold Water)
POWER MAX.100KW (Approx.)
AVERAGE POWER CONSUMPTION45 KW (Approx.)
GROSS WEIGHTT (Approx.)
FOOT PRINT( L*W*H) 4000*4000 *3200 MM
POWER ELECTRICALAC 380V/3 phases/50HZ / 5 lines

High target utilization planar sputtering deposition: please CLICK HERE to watch the video


Linear Ion Source Plasma Cleaning and Assisted Deposition: please CLICK HERE to watch video



Please contact us for more specifications, Royal Technology is honored to provide you total coating solutions.


Quality Closed Field Unbalanced Magnetron Sputtering System,  CE Certified PVD  Ion Plating Machine for sale
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