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Chromium Sputtering Targets (Cr)

Chromium Sputtering Targets (Cr)

Country/Region china
Company Advanced Engineering Materials Limited
Categories Chromium Metal Powder
Update 2019-07-13 16:36:26
ICP License Issued by the Chinese Ministry
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Chromium is a steely-grey, lustrous, hard and brittle metal which takes a high polish, resists tarnishing, and has a high melting point. Chromium sputtering targets are widely used in hardware tool coating, decorative coating and Flat display coating. Hardware coating is used in various mechanical and metallurgical applications such as robot tools, turning tools, molds (casting, stamping, ...).The thickness of the film is generally 2~10um, and the film requires high hardness, low wear, impact resistance, and resistance with thermal shock and high adhesion porperty. Now, chromium sputtering targets are common applicated in the glass coating industry. The most important application is the preparation of automotive rearview mirrors. With the increasing requirements of automotive rearview mirrors, many companies have switched from the original aluminizing process to the vacuum sputtering chromium process.

Material Notes

Purity: 99.5-99.95%
Circular: Diameter <= 14inch, Thickness >= 1mm
Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm
Targets Type: Planar sputtering target, Rotary sputtering target, Acr cathode

Analysis of Chromium Sputtering Targets

AEM Deposition manufacture chromium sputtering targets with high purity, the highest purity can reach to 99.95%. The analytical methods we use includes:
1. Metallic elements were analyzed using ICP-OES.
2. Gas elements were analyzed using LECO.
Below picture is a Metallographic diagram of Chromium Sputtering Target:

Other Information of Chromium Sputtering Targets
Decorative coating
Hardware tool coating
Glass coating
Flat panel displays
Competitive pricing
High purity and density

Hot isostatic pressing (HIP) process
Grain refined, engineered microstructure
(average grain size 60-70 um)
Semiconductor grade

Manufacturing Process
Powder preparation
Hot isostatic pressing
Grain refinement
Annealing, micrography, machining
Cleaning and final packaging - Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment
99.5% minimum purity
Semiconductor grade c
hromium compound targets
CrO3, Ni/Cr/Al/Si (54-37-6-3 wt%), CrSiO2, Cr2O3, CrN, Ni/Cr, CrSi2, CrSi
Sputtering target bonding service

Product Tags:

paper boxes


flat panel displays

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Chromium Sputtering Targets (Cr) Images

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