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Advanced Engineering Materials Limited
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Nickel Chromium Sputtering Targets (Ni/Cr)

Nickel Chromium Sputtering Targets (Ni/Cr)

Country/Region china
Company Advanced Engineering Materials Limited
Categories Chromium Metal Powder
Update 2019-07-13 16:36:17
ICP License Issued by the Chinese Ministry
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General

Material Notes

Nickel Chromium Sputtering Targets, Purity is 99.9%; Circular: Diameter <= 14inch, Thickness >= 1mm; Block: Length <= 32inch, Width <= 12inch, Thickness >= 1mm. NOTE: Ferromagnetic materials require additional consideration when selecting configuration/ thickness. High strength magnets or thinner targets may be required. Bonding these materials creates additional concerns due to the increase in distance from the magnets. Contact your magnetron sputter cathode supplier or reference your equipment manual for additional information.


Other Information of Nickel chromium Sputtering Targets
Applications
Semiconductor
Chemical vapor deposition (CVD)
Physical vapor deposition (PVD) display
Features
Competitive pricing
High purity
Grain refined, engineered microstructure
Semiconductor grade

Manufacturing Process
Refining
Three-layer electrolytic process
Melting and casting
Electrical resistance furnace - Semi-continuous casting
Grain refinement
Thermomechanical treatment
Cleaning and final packaging - Cleaned for use in vacuum
Protection from environmental contaminants
Protection during shipment
Options
99.9% minimum purity
Planar circular targets up to 18'' (457mm) diameter
Planar tiles up to 48'' (1200mm) X 15.75'' (400mm) for larger target configurations
Smaller sizes also available for R&D applications
Sputtering target bonding service


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Nickel Chromium Sputtering Targets (Ni/Cr) Images

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