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Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine

Categories Optical Coating Equipment
Brand Name: ZEIT
Model Number: MSC700-750-700
Certification: Case by case
Place of Origin: Chengdu, P.R.CHINA
MOQ: 1set
Price: Case by case
Payment Terms: T/T
Supply Ability: Case by case
Delivery Time: Case by case
Packaging Details: Wooden case
Weight: 2500±200KG, Customizable
Size: 2800mm*1000mm* 2300mm, Customizable
Vertical magnetic recording film: CoCr
Target Material: 4x4 inches (compatible with 4 inches and below)
Process Gas: Ar, N2, O2
Coating thickness: ≥10nm
Substrate carrier: With planetary rotation mechanism
Model: MSC700-750-700
Brand: ZEIT
Company Info.
ZEIT Group
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    Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine

    Dielectric Films Optical Coating Equipment Ar N2 O2 PVD Magnetron Sputtering Deposition


    Applications

    ApplicationsSpecific PurposeMaterial Type
    SemiconductorIC, LSI electrode, wiring filmAI, Al-Si, Al-Si-Cu, Cu, Au, Pt, Pd, Ag
    VLSI memory electrodeMo, W, Ti
    Diffusion barrier filmMoSix, Wsix, TaSix,, TiSx, W, Mo, W-Ti
    Adhesive filmPZT(Pb-ZrO2-Ti) , Ti, W
    DisplayTransparent conductive filmITO(In2O; -SnO2)
    Electrode wiring filmMo, W, Cr, Ta, Ti, Al, AlTi, AITa
    Electroluminescent film

    ZnS-Mn, ZnS-Tb, CaS-Eu, Y2O3, Ta2O5,

    BaTiO3

    Magnetic recordingVertical magnetic recording filmCoCr
    Film for hard diskCoCrTa, CoCrPt, CoCrTaPt
    Thin film magnetic headCoTaZr, CoCrZr
    Artificial crystal filmCoPt, CoPd
    Optical recordingPhase change disc recording filmTeSe, SbSe, TeGeSb, etc
    Magnetic disk recording film

    TbFeCo, DyFeCo, TbGdFeCo,

    TbDyFeCo

    Optical disc reflective filmAI, AITi, AlCr, Au, Au alloy
    Optical disc protection filmSi3N4, SiO2+ZnS
    Perovskite thin-film batteryTransparent conducting layerZnO:Al
    Medical treatmentBiocompatible materialsAl2O3, TiO2
    Decorative coatingColored film, Metallized filmAl2O3, TiO2, and all kinds of metal films
    Anti-discoloration coatingPrecious metal anti-oxidation coatingAl2O3, TiO2
    Optical filmsHigh-low refractive indexSiO2, TiO2, Ta2O5, ZrO₂, HfO2
    Other applicationsLightproof filmCr, AlSi, AlTi,etc
    Resistive filmNiCrSi, CrSi, MoTa, etc
    Superconducting filmYbaCuO, BiSrCaCuo
    Magnetic filmFe, Co, Ni, FeMn, FeNi, etc

    Features

    ModelMSC700-750-700
    Coating typeVarious dielectric films such as metal film, metal oxide and AIN
    Coating temperature rangeNormal temperature to 500℃ (Customizable)
    Coating vacuum chamber size700mm*750mm*700mm (Customizable)
    Background vacuum<5×10-7mbar
    Coating thickness≥10nm
    Thickness control precision≤±3%
    Maximum Coating Size≥100mm (Customizable)
    Film thickness uniformity≤±0.5%
    Substrate carrierWith planetary rotation mechanism
    Target Material4x4 inches (compatible with 4 inches and below)
    Power SupplyThe power supplies such as DC, pulse, RF, IF and bias are optional
    Process GasAr, N2, O2
    Note: Customized production available.

    Process Steps

    → Place the substrate for coating into the vacuum chamber;

    → Roughly vacuumize;

    → Turn on molecular pump, vacuumize at top speed, then turn on the revolution and rotation;

    → Heating the vacuum chamber until the temperature reaches the target;

    → Implement the constant temperature control;

    → Clean elements;

    → Revolve and back to the origin;

    → Coating film according to process requirements;

    → Lower temperature and stop the pump assembly after coating;

    → Stop working when the automatic operation is finished.


    Coating Sample


    Working Principle

    Magnetron sputtering is a kind of Physical Vapor Deposition (PVD). It makes the electrons move in spiral

    paths near the target surface by the interaction between magnetic and electric fields, thus increasing the

    probability of electrons hitting argon gas to generate ions.The generated ions then hit the target surface

    under the action of electric field and sputter the target materials to deposite thin film on the substrate surface.

    The general sputtering method can be used for preparation of various metals, semiconductors, ferromagnetic

    materials, as well as insulated oxides, ceramics and other substances. The equipment uses PLC+ touch

    panel HMI control system, which can enter parameters by programmable process interface, with the functions

    such as single target sputtering, multi-target sequential sputtering and co-sputtering.


    Our Advantages

    We are manufacturer.

    Mature process.

    Reply within 24 working hours.


    Our ISO Certification


    Parts Of Our Patents


    Parts Of Our Awards


    At ZEIT Group, we solve all your concerns through offering superior customized service, being a trusted partner and providing unmatched technology solutions. Our certified field services engineers provide global support for around-the-clock coverage that keeps your R&D or manufacturing goals on track.


    Around The Clock and Around the World Coverage
    • Global technical support experts to manage product escalations and solve issues quickly.
    • Spare parts coupled with a global footprint, all-weather response and fast delivery.
    • Availability of installation and debugging.
    Improve and Extend Your Capabilities
    • Refurbish and repair programs locally to lower your cost of ownership and decrease turn around times.
    • Resource sharing to extend your current business.
    Comprehensive Coverage by Best-in-Class Field Service Engineers
    • Performance guarantee programs such as guaranteed cost or uptime.
    • Production support programs to cover your tool or fleet for any issue with our proactive staffing and parts planning.


    Quality Dielectric Films Optical Coating Equipment PVD Magnetron Sputter Deposition Machine for sale
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